VeritySEM 5i CD-SEM 3D NAND

The newest in the Applied Materials VeritySEM product family, VeritySEM 5i CD-SEM system features first-of-its-kind, in-line, 3D capabilities for high-volume metrology of logic and memory devices at the 1xnm node and beyond. Leveraging market-leading SEMVision® G6 core technology, the new system addresses the unprecedented challenges in measuring physical dimensions posed by leading-edge geometries. Its state-of-the-art, high-resolution SEM column makes possible measurements as small as 6nminnovative image enhancement algorithms aid measurement of fine pattern details. An in-column tilt-beam enables 3D FinFET metrology, while back-scattered electron (BSE) metrology addresses high aspect ratio 3D NAND structures, and BEOL via-in-trench bottom CD and characterization metrology.

FinFETs challenge traditional metrology in such measurements as gate and fin heights, whose uniformity is critical to device performance and yield. Current in-line CD SEM technology can monitor only top-view dimension variations, not those in height and slope. The VeritySEM 5i system’s in-column beam tilt remedies these issues, enabling gate and fin heights to be calculated and controlled.As technology scales down, the aspect ratios of 3D NAND memory structures are increasing to 60:1 and beyond, making accurate measurement of the bottom CD impossible using conventional metrology. High-resolution BSE imaging enhances the signal received from within these structures, allowing the VeritySEM 5i system to “see” deep into vias and trenches for precision measurement. This capability also improves metrology for via-in-trench bottom CD in BEOL processing where the desired connectivity between underlying and overlaying metal layers must be achieved to minimize via resistance.

The VeritySEM 5i system’s exceptional in-line accuracy and process control eliminate more time-consuming and costly off-line wafer cross-sectioning while helping chipmakers to streamline process development, improve device performance and yield, and shorten ramp times to high-volume production.

The VeritySEM 5i system continues to offer hands free recipe creation and full automation. An offline recipe generator (ORG) features recipe editing capabilities via an external server, enabling multiple users to create recipes from computer-aided design offline without the need for wafers. The recipes are automatically stored in the tool database. By eliminating recipe creation time loss, the ORG enables the user to maximize the tool's utilization in production.

The tool's OPC|CheckMax is a proven solution for automating the optical proximity correction (OPC) mask qualification process. As scaling proceeds below 32nm, OPC-enhanced features are commonly incorporated into mask designs for all layers. Hundreds of CD measurements are required to verify that the features printed on the wafer are indeed what the device designers intended to produce. With a suite of proprietary algorithms, OPC|CheckMax receives input from electronic design automation systems, automatically creates CD-SEM measurement recipes, and then directs the VeritySEM 5i system to measure thousands of sites at high throughput without operator assistance.

对于快速地检测电子束曝光制造出的小纳米结构的尺寸和缺陷并保证其不受到损伤是纳米加工进入10nm尺度面临的另一重大技术问题。同时,在集成电路制造中,多层制造需要对标记进行极高精度的检测"显然,光学的无损伤检测方式己无法应用于10nm尺度范围,因此基于能量束的检测方法是必须采取的方式"。

目前工业界采用CD一SEM对小特征尺寸进行测量。

光伏发电逆变器生产厂家：

1、阳光电源股份有限公司

阳光电源股份有限公司简称“阳光电源”，是一家专注于太阳能、风能、储能、氢能、电动汽车等新能源电源设备的研发、生产、销售和服务的高新技术企业。

2、华为技术有限公司

华为技术有限公司，成立于1987年，总部位于广东省深圳市龙岗区。华为是全球领先的信息与通信技术（ICT)解决方案供应商，聚焦ICT基础设施和智能终端领域，坚持开放式合作与创新。

3、广东省古瑞瓦特新能源有限公司

广东省古瑞瓦特新能源有限公司成立于2010年5月，总部位于深圳，是一家专业提供太阳能并网、离网、储能逆变器及用户侧智慧能源管理解决方案的的高新技术企业，也是全球排名前列的光伏逆变器厂商，2020年逆变器全球出货量9830兆瓦。

4、锦浪科技股份有限公司

锦浪科技股份有限公司成立于2005年，立足于新能源行业，为一家专业从事光伏发电系统核心设备组串式逆变器研发、生产、销售和服务的高新技术企业。

5、江苏固德威电源科技股份有限公司

江苏固德威电源科技股份有限公司成立于2010年，总部位于苏州高新区，主营业务产品包括光伏并网逆变器、光伏储能逆变器、智能数据采集器以及SEMS智慧能源管理系统，也是全球逆变器十强品牌。

---