【求助】纳米薄膜制备与材料表征需要什么仪器设备

【求助】纳米薄膜制备与材料表征需要什么仪器设备,第1张

请问现在世界上最好纳米薄膜制备与材料表征需要什么仪器设备,分别是哪个国家哪个公司的最好?本人对纳米薄膜的制备及表征不是很懂,希望路过的人给你帮助,我再做细致的调研,越详细越好,越多越好。 如果制备的话,很多用MBE或者MOCVD吧,表征的话可以用SEM,AFM,XRD,XPS等等,你得看你具体的样品,xuejiang(站内联系TA)长春应用化学研究所有人在做纳米薄膜,你可以问一下,制备仪器不算贵。表征的话就用SEM,tem,xrd等。汉王重出江湖(站内联系TA)磁控溅射仪,AFM,XRD,XPSlff0432(站内联系TA)“最好的”需要很多钱,比如很好的XPS和AFM请问现在世界上最好纳米薄膜制备与材料表征需要什么仪器设备,分别是哪个国家哪个公司的最好?本人对纳米薄膜的制备及表征不是很懂,希望路过的人给你帮助,我再做细致的调研,越详细越好,越多越好。 等待高手回答ylkbyd007(站内联系TA)可以用MBE 磁控溅射、LB拉膜机、真空蒸镀。表征 可以用 AFM XRD TEM SEMpaperhunter(站内联系TA)NOVA系列全自动比表面和孔径分布分析仪纳米粒度仪(Dylisizer-2)cai_yuanyuan(站内联系TA)可以用MBE 磁控溅射、LB拉膜机、真空蒸镀。表征 可以用 AFM XRD TEM SEM贝壳摩尔(站内联系TA)低角度X射线衍射及X射线反射率测量!mengyonghong(站内联系TA)表征纳米薄膜层构参数和光学参数,最长用的是椭偏仪,包括:光谱椭偏仪、激光椭偏仪,还有专门用于过程监控的在线椭偏仪。国外厂家:美国1家、德国1家、法国2家(分别被日本和匈牙利收购了);国内厂家:1个专业椭偏仪器厂家(北京量拓),以及几个有椭偏仪的厂家竹林风bamboo(站内联系TA)一般做出来后,XRD,SEM(表面和截面)这些是必须的。XRD可以分析结构相,有人根据XRDd 三强峰来计算晶粒大小,我觉得这个不可靠,薄膜受基底影响,峰位和峰强都会有一定的改变的。表面SEM分析表面形貌,看是否有微裂纹(这个对纳米薄膜来说很重要,有微裂纹的薄膜基本上是失败了),晶粒大小与均匀度,表面粗糙度等等。还有很重要的是截面SEM,这个对纳米薄膜的表征是必须的。要说明你做的是纳米薄膜,就必须提供薄膜的厚度,以及薄膜与基底的结合情况。。。

杜绝机译,最后的EIS什么意思吃不准

Characterization: The AFM images were measured with SPA400 (Seiko Instruments Inc.) on new cleaved mica surface in tapping mode in air. The XRD patterns were obtained by using an X’Pert PRO MDP with Cu K radiation ( 1.5405 Å) with 30 mA and 40 kV.

表征:原子力显微镜图像用SPA400(精工仪器公司)在空气中以间隔模式对新劈裂的云母表面测得。XRD(X射线衍射)图形用一台采用Cu(铜)K(钾)辐射( 1.5405 Å)的X’Pert PRO MDP在30mA和40kV下获得。XPS data were obtained with an ESCALab220i-XL electron spectrometer from VG Scientific using 300 W Al K radiation. XPS(X射线光电子分光术)数据用产自VG Scientific公司的ESCALab220i-XL 电子能谱仪,采用300W Al(铝)K(钾)辐射获得。The FT-IR spectrum was recorded by a Bruker Equinox 55 FTIR spectrometer. FT-IR (傅立叶变换-红外)光谱用一台Bruker Equinox 55 FTIR分光仪记录。The I V characteristics of the cell were measured by an electrochemical analyzer (CHI630A, Chenhua Instruments Co., Shanghai) under solar simulator illumination (CMH-250, Aodite Photoelectronic Technology Ltd., Beijing) at room temperature. Cell(电池)的IV特性用一台电化学分析仪(CHI630A,上海辰华仪器有限公司出产)在

室温太阳模拟器照明(北京Aodite光电子科技有限公司的CMH- 250)下进行测量。The IPCE was measured by illumination with monochromatic light, which was obtained by a series of light filters with different wavelengths. IPCE(光电转化效率)通过用单色光照射来测量,此单色光由一系列的不同波长的滤光器得到。SEM images were obtained using a JEOL JSM-6700F scanning electron microscope at 3.0 kV. 扫描电镜图像用伊泰JEOL JSM-6700F扫描电子显微镜在3.0kV下获得。UV vis spectra were recorded on a Hitachi Model U-4100 spectrophotometer.紫外可见光谱在日立Model U-4100 分光光度计上记录。The nitrogen adsorption and desorption isotherms at the temperature of liquid nitrogen (77 K) were measured on a Quantachrome Autosorb-1 sorption analyzer with prior degassing under vacuum at 200 °C overnight. 在液氮(77K)温度下的氮吸收和解吸收等温线在伊泰Quantachrome Autosorb-1吸附分析仪上测量,事先要在200 °C 的真空下脱气过夜。Total pore volumes were determined using the adsorbed volume at a relative pressure of 0.99. 总的空隙体积用0.99相对压力下的吸附体积来确定。Multipoint BET surface area was estimated from the relative pressure range from 0.05 to 0.2. 多点BET比表面积由从0.05到0.2的相对压力范围估算。The pore size distribution of the electrodes was analyzed using the BJH algorithm. 电极的空隙尺寸分布用BJH算法分析。The EIS was carried out on a Zahner IM6e impedance analyzer (Germany) in the frequency range of 0.02 Hz to 100 kHz with illumination of 100 mW/cm2. EIS在一台Zahner IM6e阻抗分析仪(德国产)上,在0.02Hz到100kHz的频率范围内通过100mW/cm2的照射来进行。


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