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Magnetron sputtering method used in high-vacuum conditions, the deposition of metal Fe to Si (100) substrate, the formation of Fe-Si compound, and then through the vacuum annealing furnace at different temperatures and different times of the samples under the conditions of heat treatment To generate β-FeSi2 film. X-ray diffraction (XRD) of the samples were crystal structure analysis, using scanning electron microscopy (SEM) on the microstructure of the surface samples were characterized generated β-FeSi2 find the best film annealing parameters.

Uses magnetism to control the sputtering the method, under the perfect vacuum condition, in Si (100) on the substrate the deposited metal iron, then the annealing carries on the heat treatment in the vacuum annealing furnace to the sample (through temperature and annealing time), used the X-ray diffractometer (XRD) to carry on the crystal analysis to the sample, the use scanning electron microscope (SEM) the surface structure has carried on the attribute to the sample nearby, finally indicated that annealing 15h had under 920℃-960℃ the condition β-FeSi 2 appears, but the front value was very small other is the Fe-Si simple substance or the compound, annealing 30h-60h also had under 940℃ the condition β-FeSi 2 appears is not very obvious, indicated the annealing condition (The time and the temperature) form to the Fe-Si compound have the very tremendous influence.

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